ЛИТОГРАФИЯ
| Issue | Title | File | |
| Vol 54, No 4 (2025) | Perspectives of electron-beam and ion-beam lithography development in Russia |
 (Rus) |
|
| Zaitsev S.I., Irzhak D.V., Il’in A.I., Knyazev M.A., Roshchupkin D.V., Grachev V.P., Kurbatov V.G., Malkov G.V. | |||
| Vol 54, No 1 (2025) | Investigation of double patterning method with the usage of antispacer |
(Rus) |
|
| Tikhonova E.D., Gornev E.S. | |||
| Vol 53, No 5 (2024) | New concept for the development of high-performance X-ray lithography |
(Rus) |
|
| Chkhalo N.I. | |||
| Vol 52, No 5 (2023) | Protective Freely Hanging Films for Projection Lithography Installations in the Extreme UV Range |
(Rus) |
|
| Zuev S.Y., Lopatin A.Y., Luchin V.I., Salashchenko N.N., Tsybin N.N., Chkhalo N.I. | |||
| Vol 52, No 2 (2023) | Cross Sections of Scattering Processes in Electron-Beam Lithography |
(Rus) |
|
| Rogozhin A.E., Sidorov F.A. | |||
| 1 - 5 of 5 Items | |||